PDS® Products P-type (Boron Nitride) and N-type (Silicon Phosphate based) offer low cost, in-situ and non-toxic diffusion sources for silicon wafers. PDS® Products eliminate the trade-off between throughput and uniformity.
All grades of PDS® Products are available in diameters up to 200 mm. Use of PDS® Products enable the users to change sources diameter with little or no change in the diffusion process. Furthermore, Saint-Gobain Advanced Ceramics Boron Nitride offers unparalleled technical guidance based on over 40 years of experience in diffusion technology.